Type 3DSFx family of structures are fabricated by ACST Film-Diode (FD) Process. FD-Structures are implemented on a transferred membrane-Substrate, which is just few µm thin and of a low dielectric constant insulator. This allows for a drastic reduction of structure parasitic and, therefore, aims at ultimate performance at MM/SubMM-Waves. Optically-transparent membrane-substrate allows for accurate positioning for diode mounting/assembly.
The 3DSFx structure represents a single-anode Schottky diode, optimised for operation in varistor mode under Zero-Bias Condition. Low differential resistance enables easy matching with 50 Ohm reading electronics, which is of a crucial importance for high-speed electronics (data transmission systems).